Johannes Solhusvik received the B.Eng. degree in Electrical and Electronic Engineering from University of Strathclyde, Glasgow, U.K., in 1989. After graduation, he joined the Norwegian Defence Research Establishment, Kjeller, Norway, where he worked on state-of-the-art IR and CCD camera technologies aimed at low-light-level applications. He moved to France in 1992 to pursue a Ph.D. degree on low-noise CCD readout and CMOS image sensor design from Ecole Nationale Supérieure de l’Aéronautique et de l’Espace (SUP’AERO), Toulouse. After graduation in 1996, he joined ABB Corporate Research, Norway, where he worked in the field of robotics, telecommunication and CMOS imaging. In 1999, Dr. Solhusvik left ABB to establish and manage Photobit’s European design center in Oslo, Norway, chartered to design custom CMOS Active Pixel Sensors for applications such as machine vision, fingerprint sensing, meter reading, and others. Whilst working for Photobit, Dr. Solhusvik also served as assistant adjunct professor at NTNU, Trondheim, teaching CMOS sensor chip design. He managed Photobit (Norway) design center through the Micron Technology Inc acquisition in 2001 and later expatriated in 2004 to Micron’s sensor design headquarter in Pasadena, CA, from where he directed all of Micron’s sensor design teams including those located in Japan, UK and Norway. After two years in USA, he repatriated back to Micron (Norway) in 2006 and is currently focusing his efforts on sensor R&D. He has been member of the IEEE ISSCC IMMD sub-committee since 2005 and the International Image Sensor Workshop (IISW) program committee since 2006. Dr. Solhusvik was guest editor of IEEE’s Journal of Solid-State Circuits in December 2006 He served as Technical Program Chair of the 2009 IISW, Bergen, Norway